Reactive Sputter Deposition

Preface

Contents

Contributors

1 Simulation of the Sputtering Process

1.1 Introduction

1.2 Computer Simulation Codes

1.3 Total Sputtering Yield

1.4 Differential Sputtering Yield

1.5 Sputtering from Rough Surface

1.6 Sputtering of Compound Targets

1.7 Conclusion

References

2 Electron Emission from Surfaces Induced by Slow Ions and Atoms

2.1 Introduction

2.2 Physical Mechanisms

2.3 Electron Yields

2.4 The Role of Ion-Induced Electron Emission in Glow Discharges

2.5 Outlook

References

3 Modeling of the Magnetron Discharge

3.1 Introduction

3.2 Overview of Di.erent Modeling Approaches for Magnetron Discharges

3.3 Challenges Related to Magnetron Modeling

3.4 Two-Dimensional Semi-Analytical Model for a DC Planar Magnetron Discharge

3.5 PIC-MCC Model for a DC Planar Magnetron Discharge

3.6 Extension of the PIC-MCC Model: To Include Sputtering and Gas Heating

3.7 Conclusions and Outlook for Future Work

References

4 Modelling of Reactive Sputtering Processes

4.1 Introduction

4.2 Basic Model for the Reactive Sputtering Process

4.3 Steady State Equations

4.4 Influence of Material Properties and Processing Conditions

4.5 Concluding Remarks

References

5 Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering

5.1 Introduction

5.2 Some Experiments

5.3 An Extended Model for Reactive Magnetron Sputtering

5.4 Confrontation Between Experiment and Model

5.5 Towards a More Complete Model for Reactive Magnetron Sputtering

5.6 Conclusion

References

6 Transport of Sputtered Particles Through the Gas Phase

6.1 Introduction

6.2 Radial Distribution Where Sputtered Particles Leave the Target

6.3 Energy and Angular Distribution of Sputtered Particles Leaving the Target

6.4 Describing the Collision with the Gas Particle

6.5 Gas Rarefaction

6.6 Typical Results of a Binary Collision Monte Carlo Code

6.7 Specific Example: In-Plane Alignment of Biaxially Aligned Thin Films

6.8 Conclusions

References

7 Energy Deposition at the Substrate in a Magnetron Sputtering System

7.1 Introduction

7.2 Energy Measurement

7.3 Factors A.ecting Energy Flux

7.4 Total Energy per Deposited Atom

7.5 Energy Model

7.6 Conclusions

References

8 Process Diagnostics

8.1 Introduction

8.2 Electrical Probes

8.3 Mass Spectrometry

8.4 Optical Emission Spectroscopy

8.5 Optical Imaging

8.6 Laser-Induced Fluorescence

8.7 Summary

References

9 Optical Plasma Diagnostics During Reactive Magnetron Sputtering

9.1 Introduction

9.2 Emission Spectroscopy of Magnetron Plasmas

9.3 Resonant Absorption Spectroscopy of Magnetron Plasmas

9.4 Laser Spectroscopy of Magnetron Plasmas

9.5 Optical Diagnostic of High-Power Impulse Magnetron Sputtering Discharges

9.6 Conclusion

References

10 Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron E.ect

10.1 Introduction

10.2 The CCE and CME as an Inhomogeneous Target Erosion

10.3 Evidence of the CCE and CME From In Situ Measurements

10.4 CCE, CME and Film Property Distribution: ITO as an Example

10.5 CCE, CME and the Role of the Atomic Oxygen in the Process Gas

References

11 Reactively Sputter-Deposited Solid Electrolytes and Their Applications

11.1 Introduction

11.2 Crystallographic Basis of the Solid Electrolyte

11.3 Application of Solid Electrolytes

11.4 Conclusion

References

12 Reactive Sputtered Wide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films for “Transparent Electronics”

12.1 Introduction

12.2 Spinel and Delafossite Material

12.3 p-Type Transparent Conducting Oxides Based on Spinel and Delafossite Structure

12.4 Transparent Junctions Based on Spinel and Delafossite Oxides

12.6 Reactive DC Sputter Deposition of Delafossite p-CuAlO2+x Thin Film

12.7 Conclusions and Future Directions

References

13 Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering

13.1 Introduction

13.2 Energy Efficiency of Chromogenic Building Skins

13.3 Electrochromic Device Design and Materials

13.4 Properties and Applications of Electrochromic Foil

13.5 Conclusion and Outlook

References

14 Atomic Assembly of Magnetoresistive Multilayers

14.1 Introduction

14.2 Atomistic Simulations

14.3 Growth of Metal Multilayers

14.4 Ion-Assisted Growth of Metal Multilayers

14.5 Dielectric Layer Deposition

14.6 Ion-Assisted Reactive Growth of Dielectric Layers

14.7 Conclusions

References

Index